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专利名称：Maskless inter-well deep trench isolation
structure and methods of manufacture
发明人：Brent A. Anderson,Andres Bryant,Josephine
B. Chang,Michael A. Guillorn,RyojiHasumi,Edward J. Nowak,Mickey H. Yu
申请号：US13467314申请日：20120509公开号：US08536018B1公开日：20130917
专利附图：
摘要：A low power maskless inter-well deep trench isolation structure and methods
of manufacture such structure are provided. A method includes depositing a plurality oflayers over a substrate, and forming a layer over the plurality of layers. The method alsoincludes forming well structures in the substrate, and forming sidewall spacers atopposing sides of the layer. The method further includes forming a self-aligned deeptrench in the substrate to below the well structures, by removing the sidewall spacersand portions of the substrate aligned with an opening formed by the removal of thesidewall spacers. The method also includes forming a shallow trench in alignment withthe deep trench. The method further includes forming shallow trench isolation structuresand deep trench isolation structures by filling the shallow trench and the deep trenchwith insulator material.
申请人：Brent A. Anderson,Andres Bryant,Josephine B. Chang,Michael A. Guillorn,RyojiHasumi,Edward J. Nowak,Mickey H. Yu
地址：Jericho VT US,Burlington VT US,Mahopac NY US,Yorktown Heights NYUS,Crompond NY US,Essex Junction VT US,Essex Jucntion VT US
国籍：US,US,US,US,US,US,US
代理机构：Roberts Mlotkowski Safran & Cole, P.C.
代理人：Michael LeStrange
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