专利内容由知识产权出版社提供
专利名称：Measurement system and measurement
method
发明人：Hitoshi Nakatsuka,Toyoo Iida申请号：US113619申请日：20190516公开号：US11023706B2公开日：20210601
专利附图：
摘要：A measurement system includes a first distance calculation unit that searchesfor a corresponding region, indicating a same array as an array of codes indicated by apredetermined number of reference patterns included in a unit region set in the
projection pattern, from a set of the codes, and calculates a distance from an irradiationreference surface of the projection pattern to each portion of the object on the basis of asearch result of the corresponding region, and a second distance calculation unit thatattempts to estimate a distance for the defective portion for which the first distancecalculation unit is not able to calculate the distance by reconstructing an incompletecode corresponding to the defective portion using peripheral information in the inputimage.
申请人：OMRON Corporation
地址：Kyoto JP
国籍：JP
代理机构：JCIPRNET
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