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Cosmetic bases and cosmetics containing the same

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专利名称:Cosmetic bases and cosmetics containing

the same

发明人:Kei-ichi Maruyama,Yoji Tezuka申请号:US116512申请日:20051006公开号:US09193654B2公开日:20151124

摘要:Cosmetic bases consisting of alkylene oxide derivatives represented by thegeneral formula (I): Z—{O(AO)(EO)—(BO)H}(I) wherein Z is a residue derived from acompound having three to nine hydroxyl groups by the removal of the hydroxyl groups;a is 3 to 9; AO is Coxyalkylone; EO is oxyethylene; l and m represent the average numbersof added Coxyalkylene molecules and oxyalkylene molecules respectively and satisfy therelationships: 1≦1≦50 and l≦m≦50 respectively; the AO/EO weight ratio is 1/5 to 5/1 andAO's and EO's may be added at random or in block; BO is oxyalkylene having 4 carbonatoms; and n represents the average number of added BO molecules and satisfies therelationship: 0.5≦n≦5.

申请人:Kei-ichi Maruyama,Yoji Tezuka

地址:Kawasaki JP,Kawasaki JP

国籍:JP,JP

代理机构:Oliff PLC

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