您好,欢迎来到化拓教育网。
搜索
您的当前位置:首页VITREOUS SILICA CRUCIBLE AND DISTORTION-MEASURING

VITREOUS SILICA CRUCIBLE AND DISTORTION-MEASURING

来源:化拓教育网
专利内容由知识产权出版社提供

专利名称:VITREOUS SILICA CRUCIBLE AND

DISTORTION-MEASURING APPARATUS FORTHE SAME

发明人:Toshiaki SUDO,Tadahiro SATO,Ken

KITAHARA,Eriko KITAHARA

申请号:US15103609申请日:20141225

公开号:US20160313234A1公开日:20161027

专利附图:

摘要:In an embodiment, a distortion-measuring apparatus for measuring a distortion

distribution of an entire vitreous silica crucible in a non-destructive way includes: a lightsource a first polarizer and a first quarter-wave plate disposed between the light sourceand an outer surface of a vitreous silica crucible wall; a camera disposed inside of avitreous silica crucible a camera control mechanism configured to control a

photographing direction of the camera a second polarizer and a second quarter-waveplate disposed between the camera and an inner surface of the vitreous silica cruciblewall. An optical axis of the second quarter-wave plate inclines 90 degrees with respect tothe first quarter-wave plate

申请人:SUMCO CORPORATION

地址:Minato-ku, Tokyo JP

国籍:JP

更多信息请下载全文后查看

因篇幅问题不能全部显示,请点此查看更多更全内容

Copyright © 2019- huatuo9.cn 版权所有 赣ICP备2023008801号-1

违法及侵权请联系:TEL:199 18 7713 E-MAIL:2724546146@qq.com

本站由北京市万商天勤律师事务所王兴未律师提供法律服务