CYLINDRICAL MAGNETIC LEVITATION STAGE

专利名称：CYLINDRICAL MAGNETIC LEVITATION

STAGE

发明人：JEON, JEONG WOO,OH, HYUN SEOK,CHUNG,

SUNG IL,LEE, DONG YEON,JEONG, YEONHO,KANG, DO HYUN,NIKIFOROV,S.A.,CARAIANI, MITICA

申请号：KR2008005733申请日：20080929

公开号：WO2010002071A3公开日：20100715

摘要：The present invention provides a cylindrical magnetic levitation stage whichincludes a cylindrical substrate used to form micro-patterns of various arbitrary shapeson a large-area semiconductor substrate or display panel substrate, a cylindricalsubstrate, a combination of a first permanent magnet array and a first coil array and acombination of a first permanent magnet array and a first coil array, which are coupled tothe cylindrical substrate, so that levitation, axial translation and rotation of the cylindricalsubstrate can be made finely through the control of a magnetic force generated by theinteraction between a magnetic field generated by electric current applied to the coilarrays and a magnetic field generated from the permanent magnet arrays correspondingto the coil arrays.

申请人：KOREA ELECTRO TECHNOLOGY RESEARCH INSTITUTE,JEON, JEONG WOO,OH,HYUN SEOK,CHUNG, SUNG IL,LEE, DONG YEON,JEONG, YEON HO,KANG, DOHYUN,NIKIFOROV, S.A.,CARAIANI, MITICA

代理人：HALLA Patent & Law Firm

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